P02000 - SEMI P20 - Guideline for Catalog Publication of EB Resist Parameters (Proposal) StdTpc-Leadframes

P02000 - SEMI P20 - Guideline for Catalog Publication of EB Resist Parameters (Proposal) StdTpc-LeadframesThis guideline was technically approved by the Global Micropatterning Committee and is the direct responsibility of the Japanese Micropatterning Committee. Current edition approved by the Japanese Regional Standards Committee on April 28, 2003. Initially available at www. semi. org June 2003; to be published July 2003. Originally published in 1992. NOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain

It has been replaced by SEMI F119

본 버전은 global Audits and Reviews Subcommittee 에 의해 2013년 6월 4일 간행이 승인되었다

이 문서(Document)는 내부 버퍼 장비의 캐리어 전송뿐만 아니라

for which Instrumental Neutron Activation Analysis (INAA) is one method of choice

This Specification is for general usage and outlines the basic requirements for open cassettes for 150 mm sapphire wafer sizes

1  This version of the Specification applies to the substrate types: wafers

5  The Standard includes practical methodologies of flux

Standardization of these component interfaces will allow for interchangeability of gas distribution system components

regardless of design or development date

SEMI C30-0301 (technical revision)

半導体製造工場は装置の敏感性とプロセス制御の観点から高品質な電源を必要とする。半導体プロセス装置は電圧サグの影響を特に受けやすい。本仕様は，半導体プロセス装置，計測装置，自動試験装置に必要な電圧サグ対応力を定義にする。本仕様は，電圧サグ対応力と装置費用増加との間のバランスを考慮している。

Traceability Requirements