US$ 1625.00
Silicon Nitride Film (LPCVD) on Corning 7980, Film thickness: 1.3um ,10x5x0.5mm Dry Room 1500 Kgf/cm2 (TD)
$35.11
Description
1500 Kgf/cm2 (TD)
Dimensions 287 × 170 × 175 (mm)
50)E18/cc @77K
X-Ray rocking curve available
Silicon Nitride Film (LPCVD) on Corning 7980, Film thickness: 1.3um ,10x5x0.5mm Dry Room 1500 Kgf/cm2 (TD)Silicon Nitride Film Si3N4 Film coated by low stress LPCVD method Si3N4 Thickness: 1. 3um + 5% Si3N4 covers both side on Corning 7980 0F fused silica ( Warning: the Si3N4 film may have stressed induced micro cracking resulted from the large difference of thermal expansion coefficient between Si3N4 and SiO2 fused silica ) UV Grade Fused Silica (Corning 0F 7980 HPFS) Size: 10x5x0. 5mm Edge: CNC Ground Surface Quality: 60 40 or beer Non effective Area:
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